http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H01135835-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1374dd16777534b65ad4422333245af8 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-00 |
| filingDate | 1987-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73a5165336b5b70a9dacd6ae87567a2a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba7c24755cd214bd5efab172248c9df1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_19db86a01f25a0173859c8e7081791b3 |
| publicationDate | 1989-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H01135835-A |
| titleOfInvention | Production of thermoset resin |
| abstract | PURPOSE: To obtain the present resin outstanding in mechanical properties such as impact resistance and heat resistance, for, e.g., reaction molding resins, by reaction between a cyclic imino ether and polyamine compound in the presence of a salt from amide and organic sulfonic acid by heating. n CONSTITUTION: The objective resin can be obtained by reaction on heating between (A) a cyclic imino ether of formula I or II (n is 2W4; R is n-valent aliphatic alicyclic or aromatic hydrocarbon residue; in case n=2, R may be a direct bond; Ra, Rb, Rc, Rd, Re and Rf are each H, ≤3C alkyl or ≤7C aryl) and (B) at least one kind of compound selected from polyamine compounds, polyhydroxyl compounds and polycarboxylic acid compounds in the presence of (C) a salt from (i) an amine and (ii) an organic sulfonic acid. n COPYRIGHT: (C)1989,JPO&Japio |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10152557-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9704090-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008009883-A |
| priorityDate | 1987-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.