http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H01106042-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_60e21de07fa18fc54e2150daffc14654 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-72 |
| filingDate | 1987-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b826d1f4e68b694e2187d58559b75c7a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5335037ecf78862f31b5bff5fe3c44aa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3700c0f752ae2e5f7b03f626e9a945a0 |
| publicationDate | 1989-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H01106042-A |
| titleOfInvention | Photosensitive resin composition |
| abstract | PURPOSE:To increase the Tg of a photosensitive resin compsn. as a resist material and to improve the resistance to O2RIE by incorporating a compd. represented by a specified formula. CONSTITUTION:This photosensitive resin compsn. contains an alkali soluble polymer represented by formula I or II. In the formulae I, II, X is a group represented by formula III or IV, each of R'-R'<5> is hydroxyl, alkyl, etc., Y is alkyl or siloxyl, each of l, m and q is 0 or a positive integer and each of n and p is a positive integer. In the formulae III, IV, R is hydrocarbon or substd. hydrocarbon. Since the principal chain of the polymer has a polysiloxane structure, the polymer has very high resistance to oxygen plasma etching (O2RIE) and is advantageous to the formation of a fine pattern having a high aspect ratio. In spite of the polysiloxane structure, the glass transition temp. (Tg) of the polymer is above room temp. and the polymer can be used as a resist because many phenyl groups are present in the side chain. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0229652-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5712022-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5440085-A |
| priorityDate | 1987-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.