http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H01100537-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d93502a23a72b56472bc75854cfe7c60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-72 |
| filingDate | 1987-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c707ebac6e882d1a1dd7e88975d3936c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_732f88ff08d60705d80d72be365e70b2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37689ab86aa8718b8682a264f5a69497 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61721242a526dd8fd6a1367201d65789 |
| publicationDate | 1989-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H01100537-A |
| titleOfInvention | Pattern forming material |
| abstract | PURPOSE:To provide a material effective for fine working of a substrate having steps by modifying a phenolic resin, which contains an alkali soluble resin and quinone diazide compd. and in which the alkali soluble resin consists of a phenol compd. and aldehyde compd., by a specific silicone compd. CONSTITUTION:This pattern forming material is formed by modifying the phenol resin, which consists of the alkali soluble resin and the quinone diazide compd. and in which the alkali soluble resin consists of the phenol compd. and aldehyde compd., by the silicone compd. having the basic structure expressed by formula I-III. In formulas (I), (II), (III), at least one of the substituents is a functional group; (a)-(f) are >=1 integer. The pattern forming material which is effective for fine working of the substrate having steps and has the excellent resistance to RIE of oxygen is thereby obtd. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H02146544-A |
| priorityDate | 1987-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.