http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7175420-B1

Outgoing Links

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filingDate 2022-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2022-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-7175420-B1
titleOfInvention METHOD FOR MANUFACTURING MEMBERS FOR FILM-FORMING APPARATUS, METHOD FOR REMOVING DEPOSIT, METHOD FOR RECOVERING VALUABLE METAL, AND METHOD FOR REPRODUCTION OF MEMBER FOR FILM-FORMING APPARATUS
abstract Kind Code: A1 A member for a film-forming apparatus is provided, which can be easily removed without leaving deposits and is excellent in retention of deposits during use. A method for manufacturing a member for a film forming apparatus, comprising: a roughening treatment step of roughening the surface of a substrate; and plating the surface of the substrate after the roughening treatment step. and a plating step of forming a coating, wherein the plating coating consists of at least one selected from the group consisting of Mn, Fe, Co, Ni, Cu, Zn, Ga, As, Ag, Cd, and Sb, Calculated by the following formula (1) using the arithmetic mean roughness Ra (μm) on the surface of the base material after the roughening treatment step is 0.71 μm or more, and the film thickness t (μm) of the plating film A method for manufacturing a member for a film forming apparatus, wherein the value r is smaller than 1 . r 1 =0.4578t−0.5027 (1) [Selection drawing] Fig. 1
priorityDate 2022-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 27.