http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6939960-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2020-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-6939960-B1 |
| titleOfInvention | Wafer cleaning water supply device |
| abstract | PROBLEM TO BE SOLVED: To provide a wafer cleaning water supply device capable of reducing excess wafer cleaning water. SOLUTION: A wafer cleaning water supply device 1 has a wafer cleaning water manufacturing unit 2 for preparing a wafer cleaning water W1 from ultra-pure water W supplied from a supply path 5, and a storage tank 3 for the prepared wafer cleaning water. And a wafer cleaning water supply pipe 6 that supplies the wafer cleaning water W1 stored in the storage tank 3 to the cleaning nozzle 4A of the cleaning machine 4. The wafer cleaning water supply pipe 6 is branched to the cleaning machine 4 side at a distance (t) from the tip of the cleaning nozzle 4A, and a return pipe 7 is connected to the wafer cleaning water supply pipe 6, and the excess wafer cleaning water W1 in the cleaning machine 4 is connected. Can be returned to the storage tank 3. [Selection diagram] Fig. 2 |
| priorityDate | 2020-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.