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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
filingDate 2019-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2021-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-6823819-B1
titleOfInvention Resist stripper
abstract PROBLEM TO BE SOLVED: To provide a resist stripping solution in which undercut of copper or molybdenum is suppressed when a resist hard-baked on a copper / molybdenum laminated film is stripped. SOLUTION: A secondary cyclic amine of 0.5 to 5% by mass with respect to the total amount of the stripping solution, 5 to 10% by mass of basic amino acids with respect to the secondary cyclic amine, With 10 to 30% by mass of the protective agent with respect to the basic amino acid, 10 to 50% by mass of sugar alcohol with respect to the secondary cyclic amine, With organic polar solvents A resist stripping solution characterized by containing water. [Selection diagram] None
priorityDate 2019-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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