Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1245 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02172 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1295 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02142 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02175 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L85-00 |
filingDate |
2016-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2021-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2021-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-6810696-B2 |
titleOfInvention |
Hardmask composition and method for forming fine patterns on semiconductor substrates |
priorityDate |
2015-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |