Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-022 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-00 |
filingDate |
2017-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2020-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2020-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-6723947-B2 |
titleOfInvention |
Substrate pretreatment to reduce filling time in nanoimprint lithography |
priorityDate |
2015-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |