http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6643142-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-38 |
| filingDate | 2016-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-6643142-B2 |
| titleOfInvention | Mask blank, mask blank with resist film, mask blank with resist pattern, method for producing them, and method for producing transfer mask |
| priorityDate | 2016-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 42.