http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6641879-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2015-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-6641879-B2 |
| titleOfInvention | Composition for forming resist underlayer film, method for producing resist underlayer film and patterned substrate |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20230076778-A |
| priorityDate | 2015-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 245.