Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-68 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D311-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-64 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-65 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D311-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-65 |
filingDate |
2015-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2019-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2019-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-6622210-B2 |
titleOfInvention |
Sulfonate compound, photoacid generator, and resin composition for photolithography |
priorityDate |
2014-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |