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filingDate 2019-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2019-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-6597922-B1
titleOfInvention COMPOSITE STRUCTURE, SEMICONDUCTOR MANUFACTURING APPARATUS HAVING COMPOSITE STRUCTURE AND DISPLAY MANUFACTURING APPARATUS
abstract PROBLEM TO BE SOLVED: To provide a ceramic coat having excellent particle resistance and to provide a method for evaluating the particle resistance of a ceramic coat. A composite structure including a base material and a structure having a surface provided on the base material, wherein the structure includes polycrystalline ceramics, and is calculated from a TEM image analysis thereof. A composite structure in which the luminance Sa satisfies a predetermined value can be suitably used as an internal member of a semiconductor manufacturing apparatus that requires particle resistance. [Selection figure] None
priorityDate 2018-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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