http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6492821-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26 |
| filingDate | 2015-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-6492821-B2 |
| titleOfInvention | Radiation sensitive resin composition, resist pattern forming method, polymer and compound |
| priorityDate | 2015-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419510900 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11370 |
Total number of triples: 13.