http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6481334-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate | 2014-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-6481334-B2 |
| titleOfInvention | Purification method and manufacturing method of polymer for semiconductor lithography, manufacturing method of resist composition, and manufacturing method of substrate on which pattern is formed |
| priorityDate | 2014-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 67.