Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G14-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D161-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D161-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-04 |
filingDate |
2013-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2018-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2018-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-6341380-B2 |
titleOfInvention |
Composition for forming resist upper layer film for lithography and method for manufacturing semiconductor device using the same |
priorityDate |
2012-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |