http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6115115-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-06 |
| filingDate | 2012-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-6115115-B2 |
| titleOfInvention | Positive photosensitive resin composition, method for producing cured pattern using the same, method for producing convex pattern substrate, and method for producing light-emitting element |
| priorityDate | 2012-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 275.