http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6091023-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18 |
| filingDate | 2015-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-6091023-B2 |
| titleOfInvention | Nickel thin film on Si substrate by chemical vapor deposition and method for producing Ni silicide thin film on Si substrate |
| priorityDate | 2015-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.