http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6078189-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-01 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-00 |
| filingDate | 2016-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-6078189-B1 |
| titleOfInvention | IZO sintered compact sputtering target and manufacturing method thereof |
| abstract | An indium oxide-zinc oxide based oxide (IZO) sintered sputtering target in which fine holes (micropores) remaining in crystal grain boundaries are reduced is provided. In a method for producing an IZO sintered sputtering target obtained by molding and sintering a calcined powder obtained by calcining indium oxide powder and zinc oxide powder, the calcining conditions are strictly set. The oxide that constitutes the target is a composite oxide of In 2 O 3 and Zn k In 2 O k + 3 (k = 3, 4, 5), and the relative density of the target is 98.4% or more. IZO sintered compact sputtering target characterized by the above-mentioned. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109874331-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018211977-A1 |
| priorityDate | 2016-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.