| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3281
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2013-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2016-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-6040089-B2 |
| titleOfInvention |
Resist removing liquid, resist removing method using the same, and photomask manufacturing method |
| priorityDate |
2013-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |