http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6036545-B2
Outgoing Links
Predicate | Object |
---|---|
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
filingDate | 2013-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2016-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2016-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-6036545-B2 |
titleOfInvention | Photoresist composition, resist pattern forming method, polymer and compound |
priorityDate | 2012-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 434.