http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6032461-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate | 2012-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-6032461-B2 |
| titleOfInvention | Photoresist material and method for forming photoresist film |
| priorityDate | 2011-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 252.