Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D161-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-08 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-08 |
filingDate |
2011-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2016-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2016-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-6004179-B2 |
titleOfInvention |
Composition for forming resist upper layer film for EUV lithography |
priorityDate |
2010-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |