http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5893700-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 |
| filingDate | 2014-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-5893700-B1 |
| titleOfInvention | Polishing liquid composition for silicon oxide film |
| abstract | Provided is a polishing composition for a silicon oxide film capable of improving the polishing rate. In one or a plurality of embodiments, polishing for a silicon oxide film containing water, cerium oxide particles, and a compound having an amino group and a sulfonic acid group and / or a phosphonic acid group in the molecule. It is a liquid composition. In one or more other embodiments, the ratio ([number of moles of sulfonic acid group and / or phosphonic acid group] / [total surface area of cerium oxide particles]) in the polishing composition is 1.6. × a 10 -5 to 5.0 × 10 -2 mol / m 2. [Selection figure] None |
| priorityDate | 2014-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 36.