http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5885046-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate | 2015-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-5885046-B1 |
| titleOfInvention | Resist stripper |
| abstract | A hard-baked resist film is more than necessary for polymerization of a novolac resin and a DNQ compound, and is firmly fixed to a metal film as a base. For this reason, there are cases in which a hard-baked resist film cannot be peeled off with a common resist stripping solution that can peel off the resist film on the Cu film, Cu / Mo film, and Al film. A resist stripping solution comprising a cyclic amine, a polar solvent, water, a sugar alcohol, and a reducing agent, and particularly as a cyclic amine, pyrrolidine or a substituent at the 3-position of pyrrolidine There is provided a resist stripping solution using at least one of the compounds bonded with hydrazine as a reducing agent. [Selection figure] None |
| priorityDate | 2015-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 108.