http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5884961-B2
Outgoing Links
Predicate | Object |
---|---|
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
filingDate | 2011-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2016-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2016-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-5884961-B2 |
titleOfInvention | Photosensitive resist underlayer film forming composition containing photo radical polymerization initiator |
priorityDate | 2011-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 152.