Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2086 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02071 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-3409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-0073 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-362 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-361 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-88 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-245 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2086 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2082 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-532 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23G1-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F11-14 |
filingDate |
2010-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2016-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2016-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-5879269-B2 |
titleOfInvention |
Post-deposition wafer cleaning compound |
priorityDate |
2009-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |