| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2237-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2237-55
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-5445
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-5436
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-6586
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2237-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-77
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-9653
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-9646
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-963
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-96
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-785
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-6565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-6562 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B37-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-645
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-185
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B37-001
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B37-008 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B37-00 |
| filingDate |
2015-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2016-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-5861016-B1 |
| titleOfInvention |
Sintered mullite, its manufacturing method and composite substrate |
| abstract |
The mullite sintered body of the present invention is a mullite sintered body having an impurity element content of 1% by mass or less, the average particle size of the mullite sintered grains is 8 μm or less, and pores existing on the polished surface. The average of the maximum part length is 0.4 μm or less. The center line average roughness (Ra) of the surface is preferably 3 nm or less. The maximum height (Rp) of the surface is preferably 30 nm or less. The number of pores present on the surface is preferably 10 or less per 4 μm × 4 μm area. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9905459-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170110526-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9981876-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10153202-B2 |
| priorityDate |
2014-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |