http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5775264-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 |
| filingDate | 2010-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-5775264-B2 |
| titleOfInvention | Chemically amplified photoresist composition and pattern forming method |
| priorityDate | 2009-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 283.