Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D295-15 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D295-088 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D295-096 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D295-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D295-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate |
2011-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2015-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2015-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-5735284-B2 |
titleOfInvention |
Salt, photoresist composition and method for producing resist pattern |
priorityDate |
2010-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |