| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D295-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0387
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D401-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2010-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2015-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-5712926-B2 |
| titleOfInvention |
Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, pattern forming method and article using the photosensitive resin composition |
| priorityDate |
2009-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |