http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5644970-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 |
filingDate | 2014-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2014-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2014-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-5644970-B1 |
titleOfInvention | Photosensitive resin composition |
abstract | There is provided a photosensitive resin composition capable of forming a pattern having excellent wettability, that is, a pattern having high wettability on the surface of a concave substrate defined by a partition and a substrate and high liquid repellency on the upper surface of the partition. A photosensitive resin composition comprising (A), (B), (C) and (D). (A) a polymer having a structural unit having a phenolic hydroxy group and not having a structural unit having a C 4-6 perfluoroalkyl group (B) a structural unit having a C 4-6 perfluoroalkyl group Containing polymer (C) Polymerizable compound (D) Polymerization initiator [Selection] None |
priorityDate | 2014-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 501.