http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5534205-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2010-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-5534205-B2 |
| titleOfInvention | Photosensitive resist underlayer film forming composition and resist pattern forming method |
| priorityDate | 2010-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 143.