| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K31-675
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K31-704
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K31-513
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K31-7008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B15-203
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B15-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K31-427 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K31-7008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B15-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B15-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K31-675
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B33-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K31-427
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B15-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K31-513
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K31-704 |
| filingDate |
2010-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2014-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-5517799-B2 |
| titleOfInvention |
Manufacturing method of low defect density silicon using high growth rate |
| priorityDate |
2000-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |