http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5469939-B2
Outgoing Links
Predicate | Object |
---|---|
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
filingDate | 2009-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2014-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2014-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-5469939-B2 |
titleOfInvention | Positive resist composition, resist pattern forming method, polymer compound |
priorityDate | 2009-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 325.