| Predicate |
Object |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B19-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05G2-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-32 |
| filingDate |
2012-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2014-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-5439541-B2 |
| titleOfInvention |
Semiconductor exposure equipment using extreme ultraviolet light |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I734799-B |
| priorityDate |
2008-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |