http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5352127-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26 |
| filingDate | 2008-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-5352127-B2 |
| titleOfInvention | Positive resist composition, resist pattern forming method, and polymer compound |
| abstract | <P>PROBLEM TO BE SOLVED: To provide a novel high molecular compound to be utilized as a base component of a positive resist composition, a positive resist composition containing the high molecular compound, and a resist pattern forming method using the positive resist composition. <P>SOLUTION: The positive resist composition contains a base component (A) with the solubility to an alkaline developing solution increased by the action of an acid, and an acid generating agent component (B) for generating an acid by exposure. The base component (A) contains a high molecular compound (A1) having a constitutional unit (a0) represented by a specific structure and a constitutional unit (a1) represented by another specific structure. The ratio of the constitutional unit (a0) with respect to the total constitutional units composing the high molecular compound (A1) is 5-50 mole%. The ratio of the constitutional unit (a1) is higher than 10 mole%. The total of the constitutional units (a0) and (a1) is 90 mole% or less. <P>COPYRIGHT: (C)2010,JPO&INPIT |
| priorityDate | 2008-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 314.