http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5352120-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C311-51 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2008-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-5352120-B2 |
| titleOfInvention | Resist composition, resist pattern forming method, novel compound, and quencher comprising the compound |
| abstract | <P>PROBLEM TO BE SOLVED: To provide a new compound useful as a quencher for a resist composition, the resist composition containing the quencher consisting of the compound and a method for forming a resist pattern. <P>SOLUTION: This resist composition contains (A) a base material component changing its solubility with an alkaline developing liquid by the action of an acid, (B) an acid-forming component forming the acid by the exposure to light, and (D) a quencher component. The quencher component (D) contains the quencher (D1) expressed by general formula (d1-3) [wherein, R is H, F, an alkyl or a fluorinated alkyl; X is -C(O)- or -SO<SB>2</SB>-; R' is an aliphatic group; (n) is an integer of 1 to 10; and A<SP>+</SP>is an aliphatic organic cation without having an aromatic group]. <P>COPYRIGHT: (C)2010,JPO&INPIT |
| priorityDate | 2008-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 439.