http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5331321-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1214 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1288 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-49 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-423 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G09F9-30 |
| filingDate | 2007-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-5331321-B2 |
| titleOfInvention | Manufacturing method of display device |
| abstract | An electronic component or display device of the present invention can be provided by using a following pattern formation method. On a substrate treated with a first etching with a first resist pattern as a first mask, a second resist pattern is transfer-printed on the first resist patterns so as to partially overlap with the first resist pattern and partially extended from the first resist pattern. And then a second etching is performed by using the first resist pattern and the second resist pattern as a second mask. The first resist pattern and the second resist pattern are used for forming wirings and/or terminals, and the extended portion of the second resist pattern is used to make the wirings to have a cross section of a stair-like edge shape. |
| priorityDate | 2007-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.