http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5322709-B2
Outgoing Links
Predicate | Object |
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classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2009-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2013-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2013-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-5322709-B2 |
titleOfInvention | Positive resist composition and resist pattern forming method |
abstract | <P>PROBLEM TO BE SOLVED: To provide a positive resist composition having excellent lithography characteristics and obtaining a resist pattern of good shape, and a method for forming a resist pattern by using the positive resist composition. <P>SOLUTION: The positive resist composition contains a base component (A) having increased solubility to an alkali developing solution by the action of an acid, an acid generator component (B) generating an acid by exposure, and a nitrogen-containing organic compound component (D). The base component (A) contains a polymer compound (A1) that has a structural unit including -SO<SB>2</SB>- in a cyclic skeleton and includes an acid-dissociable dissolution-inhibiting group in the structure of the compound. The resist composition contains at least two kinds of the nitrogen-containing organic compound components (D). <P>COPYRIGHT: (C)2010,JPO&INPIT |
priorityDate | 2009-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 318.