http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5293168-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-792 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-788 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8247 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L43-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L43-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-39 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2008-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-5293168-B2 |
| titleOfInvention | Resist composition and method for manufacturing semiconductor device using the same |
| abstract | <P>PROBLEM TO BE SOLVED: To provide a resist composition for improving sensitivity of a resist without deteriorating the resolution thereof, and to provide a method for manufacturing a semiconductor device using the resist composition. <P>SOLUTION: The resist composition contains a metal salt, a resin and a solvent. The metal salt is preferably one of an alkali metal salt and an alkaline earth metal salt, the metal salt is preferably a cesium salt, and the content of the metal salt is preferably 5-50 mass% relative to the amount of the resin. <P>COPYRIGHT: (C)2010,JPO&INPIT |
| priorityDate | 2008-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 151.