| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-26 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D125-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2011-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2013-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-5277291-B2 |
| titleOfInvention |
Actinic ray sensitive or radiation sensitive resin composition, actinic ray sensitive or radiation sensitive film using the same, and pattern forming method |
| abstract |
An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition that can form independent line patterns with high resolution and excellent shapes and shows excellent resist performances including roughness characteristics, and to provide an actinic ray-sensitive or radiation-sensitive film and a pattern forming method using the composition. The actinic ray-sensitive or radiation-sensitive resin composition contains a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group is substituted with a group represented by the following General Formula (1) (the respective symbols in the formula represent the same definitions as in the claims and the specification). |
| priorityDate |
2011-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |