http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5210191-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate | 2009-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-5210191-B2 |
| titleOfInvention | Silicon nitride film dry etching method |
| priorityDate | 2009-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.