http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5170511-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2007-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-5170511-B2 |
| titleOfInvention | Silicon-containing resist underlayer film forming composition for forming electron beam cured silicon-containing resist underlayer film |
| priorityDate | 2007-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 722.