http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5085569-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2009-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2012-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2012-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-5085569-B2 |
| titleOfInvention | Resist underlayer film forming method and pattern forming method using the same |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107108549-A |
| priorityDate | 2009-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 240.