http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5064715-B2
Outgoing Links
Predicate | Object |
---|---|
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2006-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2012-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2012-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-5064715-B2 |
titleOfInvention | Method for producing resin solution for photoresist |
abstract | <P>PROBLEM TO BE SOLVED: To obtain a photoresist resin solution having a very low content of low-boiling impurities while suppressing degradation of a photoresist resin. <P>SOLUTION: A method for preparing such a photoresist resin solution by dissolving, in a film forming solvent, a photoresist resin comprising a repeating unit containing a group which is partly eliminated by an acid and becomes alkali-soluble and a repeating unit containing an alicyclic framework having a polar group includes the steps of: precipitating the photoresist resin obtained by polymerization in a poor solvent; separating the precipitated photoresist resin as wet crystals with a centrifuge; redissolving the wet crystals in a solvent including the film forming solvent; and distilling the resultant solution while regulating the internal pressure of a distillation can so that the temperature of the solution in the can is controlled to ≤80°C and while agitating the solution in the can with an agitator, whereby low-boiling impurities contained in the wet crystals of the photoresist resin are distilled off under reduced pressure. <P>COPYRIGHT: (C)2008,JPO&INPIT |
priorityDate | 2006-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 193.