| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-4711
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-95676 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-47
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-956 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-956 |
| filingDate |
2007-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2012-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2012-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-5039495-B2 |
| titleOfInvention |
Mask blank inspection method, reflective exposure mask manufacturing method, reflective exposure method, and semiconductor integrated circuit manufacturing method |
| priorityDate |
2007-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |