http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4982932-B2

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filingDate 2001-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2012-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2012-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-4982932-B2
titleOfInvention Manufacturing method of image display device
abstract PROBLEM TO BE SOLVED: To easily form wiring and connection holes with accuracy by reducing the number of steps. SOLUTION: After grooves are formed on a resin layer in accordance with a wiring pattern and a hydrophobic process is performed on the resin layer except the grooves, or after the hydrophobic process is performed on the resin layer and the grooves are formed on the resin layer in accordance with the wiring pattern, fine particle type conductive paste is applied to the surface of the resin layer and sintered. Consequently, metallic wiring following the shapes of the grooves is formed in a self-aligning way. The connection holes can also be formed in the same way. The hydrophobic process is performed by forming a silicon nitride film which is a hydrophobic film or performing nitriding plasma treatment.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101435255-B1
priorityDate 2001-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 21.