http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4904230-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-00 |
| filingDate | 2007-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2012-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2012-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-4904230-B2 |
| titleOfInvention | Photosensitive resin and photosensitive resin composition |
| abstract | <P>PROBLEM TO BE SOLVED: To provide photosensitive resins and a photosensitive resin composition having high sensitivity, satisfactory developability and adhesion to glass, and a cured product of the photosensitive resin composition (particularly useful for a color filter). <P>SOLUTION: The photosensitive resin (A) is obtained by reacting an epoxy resin (a) with an ethylenically unsaturated monobasic acid (b) and an imidazolesilane and/or an aminosilane (c) and further reacting the resultant resin with a polybasic acid anhydride (d). The photosensitive resin (B) further contains a compound (e) having a radical polymerizable unsaturated group and an epoxy group in the photosensitive resin (A). The photosensitive resin composition contains the photosensitive resin (A) and/or (B). <P>COPYRIGHT: (C)2008,JPO&INPIT |
| priorityDate | 2006-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 123.