| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76808
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76814 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 |
| filingDate |
2007-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2012-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2012-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-4896995-B2 |
| titleOfInvention |
Composition for etching metal hard mask material in semiconductor process |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20230125832-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150046180-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9548217-B2 |
| priorityDate |
2006-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |