http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4861237-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 |
| filingDate | 2007-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2012-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2012-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-4861237-B2 |
| titleOfInvention | Resist protective film material and pattern forming method |
| abstract | <P>PROBLEM TO BE SOLVED: To provide a resist protective film material capable of securely obtaining a rectangular satisfactory resist pattern, even when a protective film is formed on a photoresist film. <P>SOLUTION: The resist protective film material for forming the protective film on the photoresist film includes a polymer compound, containing a repeating unit having at least one among at least a carboxyl group, an α trifluoro methyl alcohol and an amine compound. <P>COPYRIGHT: (C)2008,JPO&INPIT |
| priorityDate | 2006-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 315.